January 16, 2019February 20, 2019 by sarah

University of Maine

March RIE(plasma etch) solvent bench(wet process) Silicon Etch(wet process) RCA Clean bench(wet process) Photolithography bench(mask making) Mann pattern generator(mask making) Filmetrics thin film measurement( analysis char) JA Woolam ellipsometer(analysis char) Tencor Alphastep(analysis char) MPT RTP-600s Rapid thermal process furnace AJA Sputter deposition(phys vac deposition) Oxide and anneal furnace(furnaces) Laurell PR spinner(photolithography) Karl Suss MA6 aligner(photolithography) table spin coater(photolithography) Solitec vapor prime_PR oven(photolithography) Dicing saw(packaging dicing) SCS Parylene coater(plama etch cvd) Oxford RIE(plasma etch cvd) Oxford PECVD(plasma etch cvd) Clean Room 6 confocal SEM TEM Phillips 2019-01-16_16-10-41